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Effect of high-voltage sheath electric field and ion-enhanced etching on growth of carbon nanofibers in high-density plasma chemical-vapor deposition
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10.1063/1.1993776
/content/aip/journal/jap/98/4/10.1063/1.1993776
http://aip.metastore.ingenta.com/content/aip/journal/jap/98/4/10.1063/1.1993776
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Schematic of the plasma reactor.

Image of FIG. 2.
FIG. 2.

SEM photographs of vertically aligned CNFs grown at : 5 SCCM, : 15 SCCM, ICP power: 1000 W, pressure: 18 m Torr, surface temperature: 550 °C, bias voltage: , and Ni thickness: 10 nm, with various deposition times: (a) 3, (b) 7, (c) 10, and (d) 20 min; (e) higher magnification image of a single CNF in (d).

Image of FIG. 3.
FIG. 3.

Variation of (a) CNF length, diameter, and (b) density vs deposition time. (c) A histogram showing the distribution of the CNFs diameters at different deposition times.

Image of FIG. 4.
FIG. 4.

Variation of (a) CNF length, diameter, (b) density, and bias current vs ICP power.

Image of FIG. 5.
FIG. 5.

Variation of (a) CNF length, diameter, (b) density, and bias current vs dc bias voltage.

Image of FIG. 6.
FIG. 6.

Variation of (a) CNF length, diameter, (b) density, and bias current vs pressure.

Image of FIG. 7.
FIG. 7.

Variation of (a) CNF length, diameter, (b) density, and bias current vs gas ratio.

Image of FIG. 8.
FIG. 8.

Diagram showing the geometry of CNFs and the exerted electrostatic force in electric field .

Image of FIG. 9.
FIG. 9.

Plot of the electrostatic force and adhesion force of CNF as a function of the radius of CNF with density of and bias current density of at bias voltage of 400 V.

Image of FIG. 10.
FIG. 10.

Optical emission intensity ratios of to Ar at : 32 SCCM, : 96 SCCM, Ar: 5 SCCM, ICP power: 1000 W, bias voltage: 0 V, and surface temperature: 620 °C, as a function of pressure.

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/content/aip/journal/jap/98/4/10.1063/1.1993776
2005-08-22
2014-04-17
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Effect of high-voltage sheath electric field and ion-enhanced etching on growth of carbon nanofibers in high-density plasma chemical-vapor deposition
http://aip.metastore.ingenta.com/content/aip/journal/jap/98/4/10.1063/1.1993776
10.1063/1.1993776
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