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Effects of deposition temperature on the mechanical and physical properties of silicon nitride thin films
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10.1063/1.2006972
/content/aip/journal/jap/98/4/10.1063/1.2006972
http://aip.metastore.ingenta.com/content/aip/journal/jap/98/4/10.1063/1.2006972
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

A typical load vs tip displacement curve for a thin film deposited on Si.

Image of FIG. 2.
FIG. 2.

Indentation profile used for the nanoindentation experiments.

Image of FIG. 3.
FIG. 3.

The AFM head setup for the cantilever beam resonant frequency measurement. The piezoelectric crystal drives the cantilevers in the direction and their deflections are measured by the detector.

Image of FIG. 4.
FIG. 4.

thin-film microcantilever beams. (a) SEM image of three wide, long microcantilevers, (b) schematic diagram of the cross-section profile along the length of a microcantilever, illustrating the variation of the thickness caused by chemical etching, and (c) SEM image illustrating the cross-section thickness of a microcantilever near its base.

Image of FIG. 5.
FIG. 5.

etch rates vs deposition temperature in KOH solution.

Image of FIG. 6.
FIG. 6.

Load-deflection curve for a microcantilever beam deposited at . The length from the base of the beam to the loading point was .

Image of FIG. 7.
FIG. 7.

Normalized nanoindentation data of three PECVD films deposited at varying deposition temperatures. On the axis, is the ratio of indentation depth to film thickness .

Image of FIG. 8.
FIG. 8.

Effect of deposition temperature on Young’s modulus of thin films measured using microcantilever beam-bending and nanoindentation methods.

Image of FIG. 9.
FIG. 9.

Effect of deposition temperature on density of PECVD thin films.

Image of FIG. 10.
FIG. 10.

(a) measurements of deposited films of varying thicknesses calculated from microcantilever beam-bending tests, and (b) measurements of deposited films of varying thicknesses calculated from resonant microcantilever beam tests.

Image of FIG. 11.
FIG. 11.

vs measurements of PECVD derived from microcantilever beam experiments.

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/content/aip/journal/jap/98/4/10.1063/1.2006972
2005-08-16
2014-04-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Effects of deposition temperature on the mechanical and physical properties of silicon nitride thin films
http://aip.metastore.ingenta.com/content/aip/journal/jap/98/4/10.1063/1.2006972
10.1063/1.2006972
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