A typical load vs tip displacement curve for a thin film deposited on Si.
Indentation profile used for the nanoindentation experiments.
The AFM head setup for the cantilever beam resonant frequency measurement. The piezoelectric crystal drives the cantilevers in the direction and their deflections are measured by the detector.
thin-film microcantilever beams. (a) SEM image of three wide, long microcantilevers, (b) schematic diagram of the cross-section profile along the length of a microcantilever, illustrating the variation of the thickness caused by chemical etching, and (c) SEM image illustrating the cross-section thickness of a microcantilever near its base.
etch rates vs deposition temperature in KOH solution.
Load-deflection curve for a microcantilever beam deposited at . The length from the base of the beam to the loading point was .
Normalized nanoindentation data of three PECVD films deposited at varying deposition temperatures. On the axis, is the ratio of indentation depth to film thickness .
Effect of deposition temperature on Young’s modulus of thin films measured using microcantilever beam-bending and nanoindentation methods.
Effect of deposition temperature on density of PECVD thin films.
(a) measurements of deposited films of varying thicknesses calculated from microcantilever beam-bending tests, and (b) measurements of deposited films of varying thicknesses calculated from resonant microcantilever beam tests.
vs measurements of PECVD derived from microcantilever beam experiments.
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