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Stress evolution during growth in direct-current-sputtered zinc oxide films at various oxygen flows
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10.1063/1.2061888
/content/aip/journal/jap/98/7/10.1063/1.2061888
http://aip.metastore.ingenta.com/content/aip/journal/jap/98/7/10.1063/1.2061888
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Side view of the deposition chamber. The stress measurement setup is connected to one of the top flanges, where two laser beams can reach the backside of the sample through a window.

Image of FIG. 2.
FIG. 2.

Development of the film force (a) and the derived stresses (b) in a typical zinc oxide sample prepared at 7.5 sccm oxygen flow and a pressure of 1 Pa.

Image of FIG. 3.
FIG. 3.

(a) Evolution of stress in zinc oxide at different pressures. (b) Stress of the zinc oxide samples at film thickness for different deposition pressures.

Image of FIG. 4.
FIG. 4.

Development of the film force (a) and the derived stresses (b) in a typical zinc sample prepared at .

Image of FIG. 5.
FIG. 5.

(a) Evolution of stress in metallic zinc at different pressures. (b) Stress of the zinc samples at film thickness for different deposition pressures. The solid line is a guide to the eye only.

Image of FIG. 6.
FIG. 6.

Film force (a) and derived stresses (b) of samples prepared at various oxygen flows at a pressure of .

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/content/aip/journal/jap/98/7/10.1063/1.2061888
2005-10-07
2014-04-17
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Stress evolution during growth in direct-current-sputtered zinc oxide films at various oxygen flows
http://aip.metastore.ingenta.com/content/aip/journal/jap/98/7/10.1063/1.2061888
10.1063/1.2061888
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