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In situ stress measurements in zirconium and zirconium oxide films prepared by direct current sputtering
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10.1063/1.2208733
/content/aip/journal/jap/99/12/10.1063/1.2208733
http://aip.metastore.ingenta.com/content/aip/journal/jap/99/12/10.1063/1.2208733
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Evolution of film force (a) and intrinsic stress (b) during growth of zirconium at a pressure of .

Image of FIG. 2.
FIG. 2.

Evolution of film force (a) and intrinsic stress (b) during growth of zirconium at a pressure of .

Image of FIG. 3.
FIG. 3.

(a) Evolution of stress in metallic zirconium at different pressures. (b) Stress of the zirconium samples at film thickness for different deposition pressures. The solid line is a guide to the eyes only.

Image of FIG. 4.
FIG. 4.

Film force (a) and derived stresses (b) of samples prepared at various oxygen flows at a pressure of .

Image of FIG. 5.
FIG. 5.

XRD spectra of zirconium deposited with and without a small amount of oxygen flow during deposition. The upper curve has been shifted up by for clarity.

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/content/aip/journal/jap/99/12/10.1063/1.2208733
2006-06-27
2014-04-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: In situ stress measurements in zirconium and zirconium oxide films prepared by direct current sputtering
http://aip.metastore.ingenta.com/content/aip/journal/jap/99/12/10.1063/1.2208733
10.1063/1.2208733
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