Sketch of a linear hybrid structure prepared by CEO. The metal layer has a thickness of 500 nm. The substrate is thick. The magnetic field is applied perpendicular to the 2DES, i.e., in the plane of the Au film. Lorentz force effects in Au do not play a role for the EMR effect (Ref. 11).
(a) Resistance traces measured at between contacts 2 and 4 (compare Fig. 1) in the low magnetic-field regime. From top to bottom we have of 4.0, 4.3, 5.9, 6.3, 6.4, and of 15.7, 16.5, 21.8, 22.5, and 22.7, respectively. These parameters are also valid in (b)–(d) where we normalize the data. The device parameters were , , i.e., , and . As we used the nominal symmetric EMR configuration (Ref. 3) slight asymmetries of the traces with respect to are unintentional. These are most likely due to variations in the probes’ widths after etching the mesa.
(a) The device parameters are for the gray solid line and for the broken and black lines. Traces were taken on illuminated 2DES to ensure similar conductivity. (b) The parameters are ex situ—, , , ; in situ—, , , . Slight asymmetries in are unintentional.
Relative resistance change MR vs at two different magnetic fields: triangles—MR(50 mT) and squares—MR(1 T). Open symbols are for samples with , and closed symbols interconnected by lines refer to between 2.5 and . We summarize data obtained at 4.2 K on devices with ranging from 200 to . Error bars result from the unintentional asymmetries observed in some of the devices. For we expect because the 2DES would be absent. The asterisk is a data point from Ref. 7.
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