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Fabrication of superconducting nanostructures by an electron beam lithography-based technique
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10.1063/1.2183392
/content/aip/journal/jap/99/6/10.1063/1.2183392
http://aip.metastore.ingenta.com/content/aip/journal/jap/99/6/10.1063/1.2183392
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Technological process of nanowires fabrication on magnesium diboride thin film using direct-writing EBL on PMMA resist (a) and ion milling (b) coupled with traditional optical lithography (c) followed by a second dry etching (d).

Image of FIG. 2.
FIG. 2.

SEM images of four nanowires fabricated according to the process listed in Fig. 1. The wires have width ranging from 450 down to and length of .

Image of FIG. 3.
FIG. 3.

measurements of the wide nanowire (straight line) and of the as-grown film (dashed line): the electrical properties are not degraded as a consequence of the structuring process.

Image of FIG. 4.
FIG. 4.

Critical current density of wide nanobridge plotted as a function of temperature. At , has a value of .

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/content/aip/journal/jap/99/6/10.1063/1.2183392
2006-03-30
2014-04-18
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Fabrication of superconducting MgB2 nanostructures by an electron beam lithography-based technique
http://aip.metastore.ingenta.com/content/aip/journal/jap/99/6/10.1063/1.2183392
10.1063/1.2183392
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