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Technological process of nanowires fabrication on magnesium diboride thin film using direct-writing EBL on PMMA resist (a) and ion milling (b) coupled with traditional optical lithography (c) followed by a second dry etching (d).
SEM images of four nanowires fabricated according to the process listed in Fig. 1. The wires have width ranging from 450 down to and length of .
measurements of the wide nanowire (straight line) and of the as-grown film (dashed line): the electrical properties are not degraded as a consequence of the structuring process.
Critical current density of wide nanobridge plotted as a function of temperature. At , has a value of .
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