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Temperature dependent refractive index of amorphous silicon determined by time-resolved reflectivity during low fluence excimer laser heating
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10.1063/1.2186378
/content/aip/journal/jap/99/6/10.1063/1.2186378
http://aip.metastore.ingenta.com/content/aip/journal/jap/99/6/10.1063/1.2186378
/content/aip/journal/jap/99/6/10.1063/1.2186378
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/content/aip/journal/jap/99/6/10.1063/1.2186378
2006-03-28
2014-08-22
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Temperature dependent refractive index of amorphous silicon determined by time-resolved reflectivity during low fluence excimer laser heating
http://aip.metastore.ingenta.com/content/aip/journal/jap/99/6/10.1063/1.2186378
10.1063/1.2186378
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