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Thickness dependence of the microstructure and magnetic anisotropy of sputtered films
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10.1063/1.2165583
/content/aip/journal/jap/99/8/10.1063/1.2165583
http://aip.metastore.ingenta.com/content/aip/journal/jap/99/8/10.1063/1.2165583
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

(111) x-ray peaks for films with the thicknesses of 31, 188, and .

Image of FIG. 2.
FIG. 2.

The out of-plane and in-plane hysteresis loops of specimens with indicated thicknesses.

Image of FIG. 3.
FIG. 3.

AFM image (left) and the corresponding MFM image (right) of a thick film. Inset is the enlarged AFM image.

Image of FIG. 4.
FIG. 4.

Angle dependence of hysteresis loops (in-plane) measured by MOKE for various films thicknesses (indicated).

Image of FIG. 5.
FIG. 5.

Coercivity, , and remanence ratio, , as a function of the thicknesses of the films. , are the in-plane remanences of the loops measured perpendicular and parallel to the magnetic field, respectively. The filled symbols represent data from MOKE, open symbols represent data from loop tracer.

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/content/aip/journal/jap/99/8/10.1063/1.2165583
2006-04-19
2014-04-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Thickness dependence of the microstructure and magnetic anisotropy of sputtered Fe50Ni50 films
http://aip.metastore.ingenta.com/content/aip/journal/jap/99/8/10.1063/1.2165583
10.1063/1.2165583
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