Cross-sectional TEM image and SAD measurement results.
(Color online) XRD patterns in the scan for (a) SiC wafer and (b) synthesized sample.
(Color online) [(a) and (b)] curves and (c) zero-field-cooled curve at . The magnetic fields were applied parallel and perpendicular to the sample plane.
(Color online) (a) Energy dependence of MCD intensity of the SiC wafer and synthesized sample at 300 and . (b) Magnetic field dependence of MCD intensity at of the sample at respective photon energy. The curve at is overlapped.
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