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Surface reactions during etching of organic low- films by plasmas of and
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10.1063/1.2191567
/content/aip/journal/jap/99/8/10.1063/1.2191567
http://aip.metastore.ingenta.com/content/aip/journal/jap/99/8/10.1063/1.2191567

Figures

Image of FIG. 1.
FIG. 1.

Schematic diagram of experimental setup for in situ infrared spectroscopy.

Image of FIG. 2.
FIG. 2.

Schematic diagram of experimental setup for in vacuo electron-spin-resonance spectroscopy.

Image of FIG. 3.
FIG. 3.

Typical infrared spectra of organic low- film.

Image of FIG. 4.
FIG. 4.

Difference infrared spectra of organic low- film exposed to the plasma generated from 50% .

Image of FIG. 5.
FIG. 5.

Difference infrared spectra for organic low- film after (a) exposure to and (b) etching by plasma.

Image of FIG. 6.
FIG. 6.

ESR spectrum in a plasma etch process using 50% (substrate was biased).

Image of FIG. 7.
FIG. 7.

Dependence ESR intensity of C-DBs on the remaining thickness of organic low- film in a plasma etching process using 50% .

Image of FIG. 8.
FIG. 8.

Comparative results for amounts of C-DBs in processes of plasma etching by various gases: (a) , (b) , (c) , (d) and , and (e) .

Tables

Generic image for table
Table I.

Infrared absorption.

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/content/aip/journal/jap/99/8/10.1063/1.2191567
2006-05-03
2014-04-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Surface reactions during etching of organic low-k films by plasmas of N2 and H2
http://aip.metastore.ingenta.com/content/aip/journal/jap/99/8/10.1063/1.2191567
10.1063/1.2191567
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