Schematic diagram of experimental setup for in situ infrared spectroscopy.
Schematic diagram of experimental setup for in vacuo electron-spin-resonance spectroscopy.
Typical infrared spectra of organic low- film.
Difference infrared spectra of organic low- film exposed to the plasma generated from 50% .
Difference infrared spectra for organic low- film after (a) exposure to and (b) etching by plasma.
ESR spectrum in a plasma etch process using 50% (substrate was biased).
Dependence ESR intensity of C-DBs on the remaining thickness of organic low- film in a plasma etching process using 50% .
Comparative results for amounts of C-DBs in processes of plasma etching by various gases: (a) , (b) , (c) , (d) and , and (e) .
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