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Surface reactions during etching of organic low- films by plasmas of and
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10.1063/1.2191567
/content/aip/journal/jap/99/8/10.1063/1.2191567
http://aip.metastore.ingenta.com/content/aip/journal/jap/99/8/10.1063/1.2191567
/content/aip/journal/jap/99/8/10.1063/1.2191567
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/content/aip/journal/jap/99/8/10.1063/1.2191567
2006-05-03
2014-10-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Surface reactions during etching of organic low-k films by plasmas of N2 and H2
http://aip.metastore.ingenta.com/content/aip/journal/jap/99/8/10.1063/1.2191567
10.1063/1.2191567
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