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The mechanism of chemical etching of
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10.1063/1.1420729
/content/aip/journal/jcp/116/1/10.1063/1.1420729
http://aip.metastore.ingenta.com/content/aip/journal/jcp/116/1/10.1063/1.1420729
/content/aip/journal/jcp/116/1/10.1063/1.1420729
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/content/aip/journal/jcp/116/1/10.1063/1.1420729
2002-01-01
2014-07-13
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: The mechanism of HF/H2O chemical etching of SiO2
http://aip.metastore.ingenta.com/content/aip/journal/jcp/116/1/10.1063/1.1420729
10.1063/1.1420729
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