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Secondary ions produced by 400 eV ion impact on and thin films at 8 K
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10.1063/1.1458936
/content/aip/journal/jcp/117/13/10.1063/1.1458936
http://aip.metastore.ingenta.com/content/aip/journal/jcp/117/13/10.1063/1.1458936
/content/aip/journal/jcp/117/13/10.1063/1.1458936
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/content/aip/journal/jcp/117/13/10.1063/1.1458936
2002-09-12
2014-12-22
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Secondary ions produced by 400 eV He+ ion impact on N2 and O2 thin films at 8 K
http://aip.metastore.ingenta.com/content/aip/journal/jcp/117/13/10.1063/1.1458936
10.1063/1.1458936
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