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Formation of ordered microphase-separated pattern during spin coating of ABC triblock copolymer
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10.1063/1.2710277
/content/aip/journal/jcp/126/10/10.1063/1.2710277
http://aip.metastore.ingenta.com/content/aip/journal/jcp/126/10/10.1063/1.2710277
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

AFM height [(a) and (b)] and phase images of films spin coated at onto the silicon wafers from DMF solution.

Image of FIG. 2.
FIG. 2.

AFM height image of films spin coated at from DMF solution onto the carbon-coated mica. Plan-view TEM images of the transferred film on the copper grid from the carbon-coated mica: (b) without staining and (c) staining with .

Image of FIG. 3.
FIG. 3.

AFM phase images of the films spin coated at onto the silicon wafers from DMF solutions of different concentrations: (a) , (b) , and (c) .

Image of FIG. 4.
FIG. 4.

AFM height images of the films spin coated from DMF solution onto the silicon wafers at different spinning speeds: (a) and (b) .

Image of FIG. 5.
FIG. 5.

XPS spectra with a series of tilting angles of the films spin coated from DMF solution at onto the silicon wafer (the sample of Fig. 1): (a) Si , (b) N , and (c) C .

Image of Scheme 1.
Scheme 1.

Schematic representation of the formation of ordered microphase-separated nanostructure in thin films of by spin coating.

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/content/aip/journal/jcp/126/10/10.1063/1.2710277
2007-03-08
2014-04-16
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Formation of ordered microphase-separated pattern during spin coating of ABC triblock copolymer
http://aip.metastore.ingenta.com/content/aip/journal/jcp/126/10/10.1063/1.2710277
10.1063/1.2710277
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