Nanocellular formation using block copolymer template and process. -philic block domains (shown as black) are swollen (dark gray) with under pressure. Temperature is quenched to to freeze the non--philic block domains (light gray). After depressurization, the empty cells (white) are introduced into the -philic block domains.
Schematic picture of GISAXS geometry. is defined as the directions of x ray. and are horizontal and vertical directions.
A model for distorted wave Born approximation. Uniform cells of radius are packed in a hexagonal lattice as in panel a with paracrystal distortion in panel b. The axes are defined the same way as in Fig. 2.
Examples of GISAXS patterns from PS-PFMA block copolymer thin films on silicon substrate after thermal annealing (a) and after the process (b). Incident angle of 0.15° was chosen. Intensity increases from blue to red in logarithmic scale.
Intensity vs of the nanocellular thin film at the critical of the nanocellular film. The thin arrows are 1, , , and relative to the first order. The thick arrow is the first fringe of the form factor.
Intensity vs of the nanocellular thin film at the peak .
Calculated and measured two dimensional intensity images at incident angles of 0.150° and 0.225°.
Calculated intensities using DWBA of the slices at the , with a maximum intensity, at incident angles of 0.150° (above) and 0.225° (below). Full calculation of DWBA (solid) and its components: and are transmitted and reflected components, respectively. For instance, indicates that the incident x ray was reflected, scattered, and transmitted through the sample and reached the detector.
Characterization of PS-PFMA and PS.
Model parameters for DWBA calculation.
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