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Etching of a-Si:H thin films by hydrogen plasma: A view from in situ spectroscopic ellipsometry
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10.1063/1.4893558
/content/aip/journal/jcp/141/8/10.1063/1.4893558
http://aip.metastore.ingenta.com/content/aip/journal/jcp/141/8/10.1063/1.4893558
/content/aip/journal/jcp/141/8/10.1063/1.4893558
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/content/aip/journal/jcp/141/8/10.1063/1.4893558
2014-08-26
2014-10-22
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Etching of a-Si:H thin films by hydrogen plasma: A view from in situ spectroscopic ellipsometry
http://aip.metastore.ingenta.com/content/aip/journal/jcp/141/8/10.1063/1.4893558
10.1063/1.4893558
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