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Thermal diffusion at 300 K in binary systems of helium with CH4, C2H4, C2H6, and CHF3
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10.1063/1.456565
/content/aip/journal/jcp/90/9/10.1063/1.456565
http://aip.metastore.ingenta.com/content/aip/journal/jcp/90/9/10.1063/1.456565
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/content/aip/journal/jcp/90/9/10.1063/1.456565
1989-05-01
2014-07-30
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Thermal diffusion at 300 K in binary systems of helium with CH4, C2H4, C2H6, and CHF3
http://aip.metastore.ingenta.com/content/aip/journal/jcp/90/9/10.1063/1.456565
10.1063/1.456565
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