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Pinhole free thin film CdS deposited by chemical bath using a substrate reactive plasma treatment
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10.1063/1.4828362
/content/aip/journal/jrse/6/1/10.1063/1.4828362
http://aip.metastore.ingenta.com/content/aip/journal/jrse/6/1/10.1063/1.4828362

Figures

Image of FIG. 1.
FIG. 1.

Schematic of a thin film CdTe solar cell in superstrate configuration.

Image of FIG. 2.
FIG. 2.

Water contact angle images (a) prior and (b) post plasma treatment.

Image of FIG. 3.
FIG. 3.

Three dimensional CCI images of CdS deposited on (a) untreated and (b) plasma treated substrates (20 sccm O/30 sccm Ar).

Image of FIG. 4.
FIG. 4.

Mean depth and width of pinholes in CdS observed on the surface of the untreated samples. The thickness of the CdS layer was 50 nm.

Image of FIG. 5.
FIG. 5.

SEM images of CdS films grown on (a) untreated and (b) plasma treated (20% O/30% Ar) FTO coated glass.

Image of FIG. 6.
FIG. 6.

XPS measurements of samples untreated and plasma treated (20 sccm O) for Cd 3d5/2 (a) and S2p peak (b).

Image of FIG. 7.
FIG. 7.

n (a) and k (b) dispersions measured for CdS films deposited on the untreated substrate and the plasma treated substrate (20 sccm of O).

Image of FIG. 8.
FIG. 8.

Transmission and reflection spectra for CdS thin films deposited on TEC 15, comparing the untreated and the plasma treated surface, with 20 sccm of O.

Image of FIG. 9.
FIG. 9.

Energy band gap (E) of the untreated and plasma treated sample, estimated from the [αhν]2 = f(hν), by using the Urbach equation.

Tables

Generic image for table
Table I.

Atomic % composition as determined by XPS.

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/content/aip/journal/jrse/6/1/10.1063/1.4828362
2013-10-31
2014-04-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Pinhole free thin film CdS deposited by chemical bath using a substrate reactive plasma treatment
http://aip.metastore.ingenta.com/content/aip/journal/jrse/6/1/10.1063/1.4828362
10.1063/1.4828362
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