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Conformal mapping analysis of multipactor breakdown in waveguide irises
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10.1063/1.2884712
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Affiliations:
1 Institute of Applied Physics, Russian Academy of Sciences, 603950 Nizhny Novgorod, Russia
2 Department of Radio and Space Science, Chalmers University of Technology, 412 96 Göteborg, Sweden
3 Centre National d’Études Spatiales, 31401 Toulouse Cedex 9, France
Phys. Plasmas 15, 033501 (2008)
/content/aip/journal/pop/15/3/10.1063/1.2884712
http://aip.metastore.ingenta.com/content/aip/journal/pop/15/3/10.1063/1.2884712
View: Figures

## Figures

FIG. 1.

The 2D model used in the conformal mapping analysis.

FIG. 2.

Illustration of the transformation given by Eq. (4). The lines ABCD and EFGH show the position of the iris metal surfaces in the plane (left) and in the plane (right).

FIG. 3.

The variation of the ratio for small values of the parameter . Solid line represents the approximation given by Eq. (9) and ∗ denotes the result of full numerical calculations.

FIG. 4.

The variation of the function with the parameter . Solid line represents the approximation given by Eq. (9) and ∗ denotes the result of full numerical calculations.

FIG. 5.

The dependence of the normalized electric field strength, , on normalized coordinate along the central field line for different length to height ratios (full numerical solution).

FIG. 6.

The dependence of the normalized electric field strength, , on normalized coordinate along the upper iris boundary for different length to height ratios (full numerical solution).

FIG. 7.

The evolution of the average number of electrons, (time is normalized to half the rf period), calculated for the plane-parallel model (+), the model of an iris with uniform rf field and the true geometrical length, i.e., (▵), the model of an iris with uniform rf field and the effective length (○), and the exact 2D model of the iris (●). The parameters of the secondary electron emission are and (the latter parameters correspond to a first crossover energy of for the secondary emission yield, which was used previously in Ref. 7 and coincides with the work function Wf2 given in Table A-6 to construct the multipactor charts for silver). The frequency , rf voltage amplitude , iris height , and initial electron energy are chosen so to realize the first order resonance and maximum secondary emission yield within the plane-parallel model. The iris length to height ratio is . The number of calculated electron trajectories is taken to be .

FIG. 8.

The multipactor threshold as a function of the height to length ratio . The predictions, based on the approximation of a uniform rf field and an effective iris length, , are shown by dashed lines, whereas circles represent results of the exact numerical calculations. For comparison, measurement data from Ref. 6 are also included (+). The parameters used in the calculations: Height , rf frequency , and electron initial energy , and for the secondary emission properties, and (the latter parameters correspond to a first crossover energy of for the secondary emission yield in accordance with the work function Wf2 given in Table A-6 for silver used in Ref. 7).

FIG. 9.

Illustration of the multipactor growth for different rf voltages applied to irises with the same height, , but with different lengths. The parameters used in the simulations are rf frequency , electron initial energy , and for the secondary emission properties, and . In each figure, the relative electron number, , after some particular time, , is shown as a function of the voltage amplitude, (in Volts). The arrows indicate peaks corresponding to multipactor resonances of order indicated by numbers (1, 3, 5). The peak indicated by the letter h here designates the hybrid multipactor resonances (Ref. 15). The iris length, (in mm) and the simulation time, (in rf periods), are shown in each particular figure.

/content/aip/journal/pop/15/3/10.1063/1.2884712
2008-03-11
2014-04-19

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