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Study of the change of electron temperature inside magnetic island caused by localized radio frequency heating
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10.1063/1.3418372
/content/aip/journal/pop/17/5/10.1063/1.3418372
http://aip.metastore.ingenta.com/content/aip/journal/pop/17/5/10.1063/1.3418372
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

is shown as a function of the normalized radial location of rf power deposition, , for with , , , and . The island width . The rational surface and the inner and outer edges of the island are marked by straight vertical lines. has a maximum value when is at the rational surface, and it decreases when is shifted away from the rational surface.

Image of FIG. 2.
FIG. 2.

Corresponding to Fig. 1, are shown as a function of for . When is at the rational surface, has a minimum value. As the rf power deposition is shifted away from island, approaches zero.

Image of FIG. 3.
FIG. 3.

is shown as a function of the normalized rf power for , 5, 6, 7, and 10. The center of rf power deposition is at island's o-point, and other parameters are the same as those of Fig. 1. is significant smaller for a higher than that for a lower .

Image of FIG. 4.
FIG. 4.

is shown as a function of normalized radial width of the rf power deposition, , for with . The other parameters are the same as those of Fig. 3. For , i.e., the radial rf power deposition width is smaller than the island width, significantly increases with decreasing .

Image of FIG. 5.
FIG. 5.

is shown as a function of the normalized island width for and , with the other parameters being the same as those of Fig. 3. For the value of linearly increase with island width. For it approaches a constant.

Image of FIG. 6.
FIG. 6.

is shown as a function of the normalized rf power deposition location along the helical angle, , for , , , and the other parameters being the same as those of Fig. 3. corresponds to the rf power deposition at the island's o-point (x-point). has a maximum (minimum) value when is at island's o-point (x-point).

Image of FIG. 7.
FIG. 7.

Same as Fig. 6 except that the background heat source is set to be zero. The value of at which is marked with arrows in the figure, and the helical angle between this location and the island's x-point decreases with increasing .

Image of FIG. 8.
FIG. 8.

Same as Fig. 7 except that is shown as a function of , where is the helical angle measured from the x-point, and is the heat diffusion layer width along the helical angle around island x-point for . changes from negative to positive value at for all other curves except for the case with , for which being comparable to the island width.

Image of FIG. 9.
FIG. 9.

Being similar to Fig. 8, is shown as a function of for a larger island, . changes from negative to positive value at because is satisfied for all curves.

Image of FIG. 10.
FIG. 10.

is shown as a function of for a small island, . Because in this case, changes from positive to negative value at , the middle between the o-point and the x-point.

Image of FIG. 11.
FIG. 11.

is shown as a function of normalized rf power deposition width along the helical angle, , for , with and the other parameters being the same as those of Fig. 3. With decreasing , significantly increases, suggesting a narrow rf power deposition width along the helical angle is very favorable for stabilizing locked islands.

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/content/aip/journal/pop/17/5/10.1063/1.3418372
2010-05-14
2014-04-21
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Study of the change of electron temperature inside magnetic island caused by localized radio frequency heating
http://aip.metastore.ingenta.com/content/aip/journal/pop/17/5/10.1063/1.3418372
10.1063/1.3418372
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