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Measurement of virtual cathode structures in a plasma sheath caused by secondary electrons
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10.1063/1.3695395
/content/aip/journal/pop/19/3/10.1063/1.3695395
http://aip.metastore.ingenta.com/content/aip/journal/pop/19/3/10.1063/1.3695395

Figures

Image of FIG. 1.
FIG. 1.

(Color online) Schematic diagram of the experimental setup. A: anode, F: filaments, SG: separation gird, CP: cylindrical Langmuir probe, EP: emissive probe, and MP: metal plate.

Image of FIG. 2.
FIG. 2.

(Color online) Measured potential distribution with respect to the distance from the surface of the metal plate in the case of p = 0.075 Pa and for different biases on SG2. SG1 was grounded, and the metal plate was biased at −40 V. The inset shows the details of the virtual cathode.

Image of FIG. 3.
FIG. 3.

(Color online) Measured potential distribution with respect to the distance from the surface of the metal plate in the case of p = 0.15 Pa and for different biases on SG2. SG1 was grounded and the metal plate was biased at −40 V. The inset shows the details of the virtual cathode.

Image of FIG. 4.
FIG. 4.

(Color online) Numerical sheath potential distribution calculated using the parameters in the case of p = 0.075 Pa and V and for two different SE temperatures.

Tables

Generic image for table
Table I.

The fitted position of the potential minimum , depth , and width w of the virtual cathode versus the bias on SG2 for the case of p = 0.075 Pa.

Generic image for table
Table II.

The fitted position of the potential minimum , depth , and width w of the virtual cathode versus the bias on SG2 for the case of p = 0.15 Pa.

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/content/aip/journal/pop/19/3/10.1063/1.3695395
2012-03-21
2014-04-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Measurement of virtual cathode structures in a plasma sheath caused by secondary electrons
http://aip.metastore.ingenta.com/content/aip/journal/pop/19/3/10.1063/1.3695395
10.1063/1.3695395
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