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Laser produced plasma sources for nanolithography—Recent integrated simulation and benchmarking
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10.1063/1.4807379
/content/aip/journal/pop/20/5/10.1063/1.4807379
http://aip.metastore.ingenta.com/content/aip/journal/pop/20/5/10.1063/1.4807379
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Mist density from 50-m droplet created by pre-pulse laser with 266 nm wavelength, ∼10 mJ, 50 m spot. Dotted line shows initial shape of droplet.

Image of FIG. 2.
FIG. 2.

Mist density from 50-m droplet created by pre-pulse laser with 1064 nm wavelength, 400 mJ, 100 m spot. Dotted line shows initial configuration of fragmented droplet.

Image of FIG. 3.
FIG. 3.

Vaporization of 50-m droplet by laser photons and by LPP with 1064 nm wavelength laser, 10 ns FWHM, 400 mJ, 100 m spot.

Image of FIG. 4.
FIG. 4.

Mass density evolution of distributed fragments after CO laser pulse heating with total mass equivalent to 50 m droplet.

Image of FIG. 5.
FIG. 5.

Mass density distribution developed by 266 nm laser from 50 m droplet at optimum delay time for efficient coupling with CO laser with 500 m spot size.

Image of FIG. 6.
FIG. 6.

Mass density distribution developed by 266 nm laser from 20 m droplet at optimum delay time for efficient coupling with CO laser with 300 m spot size.

Image of FIG. 7.
FIG. 7.

Mass density distribution developed by 266 nm laser from 10 m droplet at optimum delay time for efficient coupling with CO laser with 200 m spot size.

Image of FIG. 8.
FIG. 8.

EUV source from 50-m droplet preheated by 266 nm laser and distributed during 500 ns. Main laser is CO with 500 m spot and 350 mJ.

Image of FIG. 9.
FIG. 9.

EUV source from 20-m droplet preheated by 266 nm laser and distributed during 300 ns. Main laser is CO with 300 m spot and 140 mJ.

Image of FIG. 10.
FIG. 10.

Ions kinetic energies of HEIGHTS modeling of planar Sn target; 15 mJ for pre-pulse and 90 mJ for CO laser.

Image of FIG. 11.
FIG. 11.

Ions kinetic energies in CMUXE experiments from planar Sn target; 15 mJ for pre-pulse and 90 mJ for CO laser. Reprinted with permission from Freeman , Appl. Phy. A , 853 (2013). Copyright 2012 Springer.

Image of FIG. 12.
FIG. 12.

MLM surface response to Sn ions with Gaussian distribution of energies around 50 eV.

Image of FIG. 13.
FIG. 13.

MLM surface response to Sn ions with Gaussian distribution of energies around 2.5 keV.

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/content/aip/journal/pop/20/5/10.1063/1.4807379
2013-05-21
2014-04-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Laser produced plasma sources for nanolithography—Recent integrated simulation and benchmarking
http://aip.metastore.ingenta.com/content/aip/journal/pop/20/5/10.1063/1.4807379
10.1063/1.4807379
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