Skip to main content

News about Scitation

In December 2016 Scitation will launch with a new design, enhanced navigation and a much improved user experience.

To ensure a smooth transition, from today, we are temporarily stopping new account registration and single article purchases. If you already have an account you can continue to use the site as normal.

For help or more information please visit our FAQs.

banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
The full text of this article is not currently available.
Y. Min, L. Xiaoping, X. Kai, L. Yanming, and L. Donglin, Phys. Plasmas 20, 012101 (2013).
M. A. Lieberman and A. J. Lichtenberg, in Principles of Plasma Discharges and Materials Processing, 2nd ed. ( John Wiley & Sons Inc., New Jersey, 2005).
S. I. Eliseev and A. A. Kudryavtsev, Phys. Plasmas 23, 094701 (2016).

Data & Media loading...


Article metrics loading...



We respond to the issues raised in the comment by Eliseev and Kudryavtsev [Phys. Plasmas , 094701 (2016)]. We re-examine the principle of plasma generation and the operating situations in our plasma device, and some simplified models are founded to illustrate the qualitative relations between the pressure and the magnitude and uniformity of . We stand by our original conclusions in our plasma device that the magnitude and uniformity of are in roughly reverse proportion to the gas pressure in the chamber, as observed in the experiment.


Full text loading...


Access Key

  • FFree Content
  • OAOpen Access Content
  • SSubscribed Content
  • TFree Trial Content
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd