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Diffused Germanium Resistors for Thermometry in 20 to 70°K Range
1.T. H. Geballe in Semiconductors, N. B. Hannay, Ed. (Reinhold Publishing Corp., New York, 1959), Ch. 8.
2.K. D. Timmerhaus in Cryogenic Technology, R. W. Vance, Ed. (John Wiley & Sons, Inc., New York, 1963), Ch. 6.
3.B. G. Cohen, W. B. Snow, and A. R. Tretola, Rev. Sci. Instr. 34, 1091 (1963).
4.E. L. Jordan, J. Electrochem. Soc. 108, 478 (1961).
5.Eastman Kodak Co., Photoresist.
6.The diffusion is performed in a closed quartz chamber, using an Sb‐Ge eutectic alloy source and a dry hydrogen ambient.
7.R. L. Powell, M. D. Bunch, and R. J. Corruccini, Cryogenics 1, 139 (1961).
8.This anomalous magnetoresistance is observed on only a few units and may be due to imperfect or injecting contacts.
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