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Cluster-eliminating filter for depositing cluster-free a-Si:H films by plasma chemical vapor deposition
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10.1063/1.2126572
/content/aip/journal/rsi/76/11/10.1063/1.2126572
http://aip.metastore.ingenta.com/content/aip/journal/rsi/76/11/10.1063/1.2126572

Figures

Image of FIG. 1.
FIG. 1.

Cluster-eliminating filter: (a) photos and (b) schematic cross-sectional view.

Image of FIG. 2.
FIG. 2.

Reactor A for evaluating the cluster-eliminating efficiency of the filter.

Image of FIG. 3.
FIG. 3.

Reactor B equipped with cluster-eliminating filter for depositing cluster-free a-Si:H films.

Image of FIG. 4.
FIG. 4.

Dependence of on volume fraction of clusters incorporated into a-Si:H films. Solid circles and gray rectangles are results of films deposited by cluster-suppressed plasma CVD without cluster-eliminating filter reported in Ref. 10. Solid square corresponds to conventional device quality films.

Tables

Generic image for table
Table I.

values and deposition rates for films deposited without and with the filter.

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/content/aip/journal/rsi/76/11/10.1063/1.2126572
2005-11-07
2014-04-17
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Cluster-eliminating filter for depositing cluster-free a-Si:H films by plasma chemical vapor deposition
http://aip.metastore.ingenta.com/content/aip/journal/rsi/76/11/10.1063/1.2126572
10.1063/1.2126572
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