Experimental (●) and simulated (—) x-ray reflectivity curves for 10–100 nm films.
Variation of the spectroscopic ellipsometry parameter “” on the incident wavelength for films, measured at an angle on incidence of 75°. Experimental points are represented by (X) while solid lines show the simulated results.
The wavelength dependence of the refractive index for 10–100 nm films. The solid lines represent the average value of the refractive index while the symbols represent the individual data points.
Comparisons of film thickness using spectroscopic ellipsometry and x-ray reflectivity. Symbols represent the individual results and solid line shows the fitted results by a linear least-squares analysis. The linear equations fitting the data points are also shown for the interface layer (a) included and (b) excluded.
Deposition conditions for films.
Average thickness and density values obtained from XRR for layered structures, with “linearly graded interface” layer. The values are reported with (esd), the standard deviations from the average values for-six measurements performed over each sample.
Average thickness obtained from SE for layered structures. The values are reported with (esd), the standard deviations from the average values for six measurements performed over each sample. The refractive index values at are also shown.
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