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High-throughput resistivity apparatus for thin-film combinatorial libraries
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10.1063/1.2037947
/content/aip/journal/rsi/76/9/10.1063/1.2037947
http://aip.metastore.ingenta.com/content/aip/journal/rsi/76/9/10.1063/1.2037947

Figures

Image of FIG. 1.
FIG. 1.

van der Pauw arrangement of current and voltage leads on a cylindrical sample. A current is applied to contact and grounded at , and the voltage is measured across and .

Image of FIG. 2.
FIG. 2.

A quartz substrate with sputtered silver library loaded into the cryostat for measurement. Thermocouples can be seen fastened to the substrate via bolts.

Image of FIG. 3.
FIG. 3.

The 196-pin device which makes electrical contact to the 49-sample thin-film library for four-contact resistivity measurements. The shortest distance between pins is .

Image of FIG. 4.
FIG. 4.

A schematic drawing of the radiation shield. The shield rests on, and makes a vacuum seal to, the cryostat with the aid of an O-ring.

Image of FIG. 5.
FIG. 5.

The radiation shield installed on the cryostat. Liquid nitrogen is filled at the top (after the styrofoam top is removed). The vacuum chamber containing the samples can be seen near the bottom of the picture.

Image of FIG. 6.
FIG. 6.

Silver film thickness vs distance from the center of the substrate (opposite target center) for the THIN library. .

Image of FIG. 7.
FIG. 7.

Silver film thickness vs distance from the center of the substrate (opposite target center) for the THICK library. .

Image of FIG. 8.
FIG. 8.

Resistivity vs temperature data for silver thin films on warming: THIN library . The top row are the thickest films and hence the least resistive. The film thickness linearly increases with each row, to the thinnest film in the bottom row. Horizontal axis ranges from and the vertical axis ranges from .

Image of FIG. 9.
FIG. 9.

Resistivity vs temperature data for silver thin films on warming: THICK library . The top row are the thickest films and hence the least resistive. The film thickness linearly increases with each row, to the thinnest film in the bottom row. Horizontal axis ranges from and the vertical axis ranges from .

Image of FIG. 10.
FIG. 10.

The resistivity vs film thickness for both thick and thin silver libraries.

Image of FIG. 11.
FIG. 11.

The temperature coefficient of resistivity as a function of thickness.

Image of FIG. 12.
FIG. 12.

AFM image, looking downward, for the Ag film. The vertical line is the location that the cross section was taken for Fig. 13.

Image of FIG. 13.
FIG. 13.

The cross section, showing height vs distance, traverses alone the vertical line in Fig. 12. The zero distance corresponds to the bottom of Fig. 12. Vertical scale is nm and horizontal scale is .

Image of FIG. 14.
FIG. 14.

High magnification AFM image, looking downward, near the center of the thick Ag film.

Image of FIG. 15.
FIG. 15.

Cross section along the vertical line in Fig. 14. Location of this film is approximately at the center of the thickest film. Vertical scale is Å and the horizontal scale is nm.

Tables

Generic image for table
Table I.

Average thickness (nm) for each member of the THIN film library. Row 1 was the furthest from the center of the sputtering table so is the thickest. Row 6 is the thinnest row as it was closest to the center of the sputtering table. The variation in each thickness is .

Generic image for table
Table II.

Average thickness (nm) for each member of the THICK film library. The variation in each thickness is .

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/content/aip/journal/rsi/76/9/10.1063/1.2037947
2005-09-12
2014-04-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: High-throughput resistivity apparatus for thin-film combinatorial libraries
http://aip.metastore.ingenta.com/content/aip/journal/rsi/76/9/10.1063/1.2037947
10.1063/1.2037947
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