Optical system designed for hard x-ray nanofocusing.
Relationship between slit size and FWHMs predicated by wave-optical calculation.
Schematic drawing of scanning x-ray fluorescence microscope system.
Focused beam profiles obtained with KB mirrors. Subscripts at the top right show virtual source size.
Test pattern fabricated using FIB system.
Observation results of test chart using SXFM. Scan parameters are shown in Table III. Graphs of (5) and (6) show line profiles along the dash line in the W and Ga distribution maps.
Beam profiles before and after long scanning shown in Figs. 6(5) and 6(6). The time difference between the profiles is .
Thermal stability of mirror manipulator and sample holder.
Relationship between FWHM broadening and incident angle errors of the mirror. The vertical axis indicates the ratio to the best FWHM.
Parameters of elliptical mirrors.
Relationship between estimated beam size and measured photon fluxes.
Scan parameters of SXFM. Exposure time: for each scan.
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