1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Design of a UHV-compatible rf plasma source and its application to self-assembled layers of nanoparticles
Rent:
Rent this article for
USD
10.1063/1.2336192
/content/aip/journal/rsi/77/8/10.1063/1.2336192
http://aip.metastore.ingenta.com/content/aip/journal/rsi/77/8/10.1063/1.2336192
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

(Color online) Photograph of the assembled plasma source attached to the UHV chamber (inset: construction view).

Image of FIG. 2.
FIG. 2.

(Color online) Image of the plasma source fully assembled: (a) front view and (b) top view). The electrical feedthrough for mounting the phase electrode and the bottom flange for mounting the ground electrode are attached. The feedthroughs are labeled according to their function. All flanges are CF type to ensure UHV and bakeout compatibilities.

Image of FIG. 3.
FIG. 3.

(Color online) Drawing of the electrode configuration. The electrode gap can be varied by shifting the ground electrode in the direction of the slotted holes, while alignment of the electrodes is adjusted via the rotating bottom and feedthrough flanges. Insets (a) and (b) show the adapter for the socket to the copper rod of the current feedthrough.

Image of FIG. 4.
FIG. 4.

(Color online) Image of the phase electrode (exploded view) with an Omicron sample stage. The electrode is made of molybdenum with a sample cavity at the top. The sample is held in place by a backplate and two molybdenum springs.

Image of FIG. 5.
FIG. 5.

(Color online) A drawing of a sample holder with sample fitting to hold the sample surface in-plane with respect to the electrode surface, while maintaining compatibility with an Omicron STM.

Image of FIG. 6.
FIG. 6.

A diagram of pumps, gas supply, and power lines connected to the plasma source.

Image of FIG. 7.
FIG. 7.

(Color online) Illustration of the sample handling mechanism: Samples are transported by a standard transfer rod between the UHV chamber and a sample stage in the loadlock. In the sample stage, samples are rotated by 90° and then moved into the plasma source via a vertically mounted wobblestick.

Image of FIG. 8.
FIG. 8.

SEM images ( each) of particles spin-coated onto substrates before and after treatment with oxygen plasma at varied powers.

Image of FIG. 9.
FIG. 9.

XP spectra of a spin-coated monolayer of particles on a substrate before plasma treatment and after subsequent exposure to oxygen plasma at , oxygen plasma at , and then hydrogen plasma at ( each). The dashed plots represent the metallic (lower binding energy) and oxidic (higher binding energy) components of the fitted signal.

Loading

Article metrics loading...

/content/aip/journal/rsi/77/8/10.1063/1.2336192
2006-08-24
2014-04-25
Loading

Full text loading...

This is a required field
Please enter a valid email address
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Design of a UHV-compatible rf plasma source and its application to self-assembled layers of CoPt3 nanoparticles
http://aip.metastore.ingenta.com/content/aip/journal/rsi/77/8/10.1063/1.2336192
10.1063/1.2336192
SEARCH_EXPAND_ITEM