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Schematic diagram of the experimental setup for the proposed electrochemical etching method with an attached mass.
Variation of etching duration with respect to the size of attached mass (, 0.06, 0.9, 0.11, 0.13, and ).
Apex size and yield rate of the tungsten tips with respect to the size of attached mass.
Cone angle of the sub- tips with respect to attached mass.
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