Sketch of the optical chamber. The part of the vacuum line with the ionization gauge is shown also on the left side (both side and top view). 1: sample holder; 2: sample (polymer coated silicon wafer); 3: probing light beam; 4: heaters; 5: RTD; 6: copper braid; 7: head of the chamber; 8: optical window assemblies; 9: silica windows; 10: trap; 11: the cold surface of the trap; 12: electrical feedthrough outlet; 13: vacuum line; 14: ionization gauge.
Mass spectra of the residual gas in the case of a warm (bars) and cold (diamonds) traps. The residual gas pressures are and , respectively.
Derivative plots for thick PS film (average from six scans) and thick PMMA film (average from 14 scans). Solid line denotes cooling curve and dashed line denotes heating curves.
Heating plot and construction for calculation, thick PS film, averaged from six scans. denotes the area of the figure; points A and E lie on the linear part of the curve D.
Derivative plots for a thick PS film. Heating and cooling curves at high vacuum at room temperature), averaged from 15 scans, are shown by △ and ▽ symbols, respectively. Low vacuum heating and cooling curves, averaged from four scans, are shown by ▲ and ▼ symbols, respectively.
and plots for a bare Si substrate at high vacuum at room temperature), averaged from ten scans. Heating and cooling curves are shown by dashed and solid lines, respectively. Heating and cooling plots are shown by △ and ▲ symbols, respectively.
Systematic change of with time upon annealing and thermal cycling (upper curve). The IG is turned on during the experiment. The sample is a thick PMMA film on Si. The corresponding temperature program is shown by the lower curve.
Derivative plots for the same sample as in Fig. 7. Filled and open symbols denote cooling and heating curves, respectively.
AFM image of the thick PS sample (a) as spin coated and (b) after a typical annealing and temperature cycling experiment (the IG is switched on).
Forced warming of the trap during the temperature program (the bottom curve) for thick PMMA film. The IG is turned on. and residual gas pressure as functions of time are shown by the top and middle curves, respectively.
Slow release of the trapped residual gas during annealing of a thick PS film at . Residual gas pressure (lower curve) and (upper curve) vs time are shown.
Residual gas composition during slow release of the trapped residual gas. The top line and symbol curve shows the residual gas pressure. Species , , , and are denoted by dashed, solid, dotted, and dash-dot lines, respectively.
Derivative plot for a thick PMMA film on Si, obtained upon heating (average from 12 scans).
Characteristics of polymers.
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