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(a) Diagram of a wedged MLL showing the progressively increasing layer tilt required to satisfy the Bragg condition at all positions along the axis. The geometrical intersection of all the layers with the axis occurs at twice the focal length, measured from the upstream face of the wMLL. (b) Four different types of multilayer Laue lens: flat, tilted, wedged, and curved.
(a) Schematic of single-gradient mask used to produce the lateral deposition rate. (b) Photo of multiple-gradient mask with the sputtering target located behind. Each triangular tooth creates a lateral gradient across one Si substrate so that six samples may be grown simultaneously with this mask. The center of the aperture is used to grow a uniform film for growth rate analysis.
(a) SEM image of the thick region of the wMLL. The diagonal striations are damage generated during dicing and polishing of the wMLL section. (b) Total structure thickness as a function of the position along the sample as obtained from multiple SEM image analyses (the curve is merely a guide to the eye). The linear tangent shows the extrapolated intersection of all the layers at the thick region, which should be at .
(a) Layer spacing profile obtained from analysis of the SEM image from Fig. 3, plotted as vs . The large downward spikes are due to layer separation from polishing damage. (b) Simulated and normalized intensity contours (isophotes) in the focus region for a thick section with the layer spacing profile shown by the linear fit in (a) at . (c) The simulated intensity profile at the focus, with a FWHM of and efficiency of 36.6% (Ref. 17).
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