Schematic layout of the ALS beamline 12.3.2 with a superbend dipole magnet source. The beamline acceptance is 0.2 mrad (horizontal and vertical). The toroidal M2 mirror focuses the source onto a virtual object. This intermediate image is demagnified by a ratio of 8:1 and 16:1 in horizontal and vertical, respectively, by a pair of KB mirrors. A four-bounce Si(111) monochromator can optionally be brought into the beam path for monochromatic microdiffraction on nanosized grains.
Results of an online Hartmann test on the horizontal KB mirror. The variously colored lines refer to different bend settings. The red line corresponds to the optimized setting and is depicted with the vertical scale in microrad slope error in the inset.
Schematic of monochromator with basic measures, elevation, and cross section. The channel cut Si crystal has an additional groove cut into the lower crystal to allow for passing the direct white beam when the crystals are set to 0°.
Schematic sketch of the sample stage. Two stacked -stages allow for centering the sample onto the rotation axes and the rotation axes onto the focus spot.
Horizontal vibrational spectrum as measured from the intensity variation induced by a knife edge placed on the sample stage in the middle of the beam. Note the prominent modes at 40 and 45 Hz mainly caused by horizontal vibrations of the sample stage.
Measured spot shape on beamline 12.3.2. The spot size is measured by scanning a 0.15 mm thick W-wire through the beam and recording the absorption. The derivative of this measurement gives the spot shape. The FWHM of the horizontal and vertical focus spots are 0.63 and , respectively.
(a) Calculated and observed flux curve for the monochromatic beam. Both curves have been determined with 0. 15 mm (h) (v) source slits and aperture slits. (b) Calculated flux curve for white beam configuration assuming an (h) (v) source size, i.e., spot size. A 0.1% bandwidth window is assumed for the calculations.
(a) Out-of-plane orientation map of the solder joint in which electrons flow from the bottom to the top and the top left corner is the current flow corner. (b) Angular variation between the -axis of the grains marked in the orientation map and the electron flow direction as a function of electromigration time. Label numbers refer to the grains numbered in (a).
Effective resistivity of selected grains as a function of electromigration time. Label numbers refer to the grain numbers in Fig. 8(a).
Orientational spread of crystallographic -axis of Aragonite platelets relative to their mean value: (a) at calcite—nacre boundary, (b) from boundary, and (c) from boundary.
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