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Efficient fabrication of wafer scale thin film of individualized single-walled carbon nanotubes by dual-nozzle spin casting
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10.1063/1.3455212
/content/aip/journal/rsi/81/6/10.1063/1.3455212
http://aip.metastore.ingenta.com/content/aip/journal/rsi/81/6/10.1063/1.3455212

Figures

Image of FIG. 1.
FIG. 1.

(a) Schematic diagram of the individualization process: ① initial dispersion: 0.3wt % of of water (50 ml); ② homonization: low power sonication for 10 min at 140 W and ultrasonication for 30 min at 540 W using tip sonicator; ③ individualization: centrifugation for 2.5 h with 150 000 g; ④ finally, individualized solution: the upper 30% of the was carefully decanted. (b) Absorption spectra of individually dispersed SWNTs. The absorption curve over 1000 nm includes the fluorescence peaks of the individualized semiconducting nanotubes.

Image of FIG. 2.
FIG. 2.

Schematics of the experimental setup of (a) micronozzle based spin casting and (b) spray method.

Image of FIG. 3.
FIG. 3.

FESEM images of the SWNT layer according to the surface functionalization of the substrate: (a) 5000 rpm spin casting without functionalization (50 000×), (b) 5000 rpm spin casting with 10 mM functionalization (50 000×), (c) spray method without functionalization (800×), and (d) spray method with 10 mM functionalization (50 000×).

Image of FIG. 4.
FIG. 4.

The adhesion mechanism of (a) the pure SWNT and (b) the surfactant wrapped SWNT on a bare wafer without APTES functionalization.

Image of FIG. 5.
FIG. 5.

Comparison of the AFM images of the SWNT layers depending on the concentration of the substrate functionalization (rotation speed: 5000 rpm): (a) 1 mM concentration at center area, (b) 1 mM concentration at edge area, (c) 10 mM concentration at center area, (d) 10 mM concentration, edge area, (e) 100 mM concentration at center area, and (f) 100 mM concentration at edge area.

Image of FIG. 6.
FIG. 6.

AFM images of the SWNT layer according to the variations in physical experimental condition for SWNT deposition: (a) 1000 rpm velocity, center area, (b) 1000 rpm velocity, edge area, (c) 3000 rpm velocity, center area, (d) 3000 rpm velocity, edge area, (e) 5000 rpm velocity, center area, (f) 5000 rpm velocity, edge area, (g) spray method, center area, and (h) spray method, edge area.

Image of FIG. 7.
FIG. 7.

633 nm Raman spectra analysis around the radial breathing mode for the resultant SWNT monolayer. The upper side is the result on pristine SWNTs on nonfunctionalized substrate and the lower side is the resultant SWNT layer on functionalized substrate.

Tables

Generic image for table
Table I.

Comparison of rms roughness according to the various experimental conditions for the SWNT layer.

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/content/aip/journal/rsi/81/6/10.1063/1.3455212
2010-06-30
2014-04-25
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Efficient fabrication of wafer scale thin film of individualized single-walled carbon nanotubes by dual-nozzle spin casting
http://aip.metastore.ingenta.com/content/aip/journal/rsi/81/6/10.1063/1.3455212
10.1063/1.3455212
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