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Vector control of induced magnetic anisotropy using an in situ quadrupole electromagnet in ultrahigh vacuum sputtering
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10.1063/1.4725527
/content/aip/journal/rsi/83/6/10.1063/1.4725527
http://aip.metastore.ingenta.com/content/aip/journal/rsi/83/6/10.1063/1.4725527
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

(a) Layout of the field sputtering system; FE: electrical feedthrough for the coils of the electromagnet, 2 3/4 conflat flange (CF); PS2, PS1: bipolar power supplies (Kepco BOP 20-20M) for coil pairs 2 and 1, respectively; DAQ: MIO DAQ (NI 6212); (b) shape and dimensions of the silicon steel core (4% Si, Scientific Alloys); (c) coils arrangement of the electromagnet and magnetic flux in the core.

Image of FIG. 2.
FIG. 2.

(a) Schematic: vector sum of the two orthogonal fluxes at the center point of the electromagnet; (b) the correspondence between the sputtering field and the applied ac currents; as shown in the middle panel, different choice in the initial phase ϕ would make the field start rotating at a different angle θ.

Image of FIG. 3.
FIG. 3.

Linear relationship between the applied voltage control and measured magnitude of the rotating magnetic field.

Image of FIG. 4.
FIG. 4.

(a) Alignment of the sample and the sputtering field; the field direction is determined by the initial phase ϕ; the default setting of ϕ = 0 results in a sputtering field parallel to the sample reference axis; (b) FMR setup configuration: the film side of the sample is facing the coplanar waveguide (CPW); the sputtering field direction is also the easy axis of the sample with uniaxial induced anisotropy.

Image of FIG. 5.
FIG. 5.

(a) B-H loop of sample 1 in set 1; (b) B-H loop of sample 2 in set 1; (c) B-H loop of sample 1 in set 2; (d) FMR Kittel relation of sample 1 in set 2.

Image of FIG. 6.
FIG. 6.

Change of ferromagnetic resonance field H0 at 4 GHz, as the angle α between the FMR bias field H B and the sample reference axis R varies from 0° to 180°.

Image of FIG. 7.
FIG. 7.

Change of ferromagnetic resonance field H 0 at 4 GHz, as the initial phase of the rotating magnetic field ϕ varies from 0° to 180°; each data point corresponds to one samplea; FMR setup configuration for samples 2-9: the induced anisotropy of the film is determined by the sputtering field direction; the sample reference axis is always parallel with the FMR bias field.

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/content/aip/journal/rsi/83/6/10.1063/1.4725527
2012-06-07
2014-04-25
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Vector control of induced magnetic anisotropy using an in situ quadrupole electromagnet in ultrahigh vacuum sputtering
http://aip.metastore.ingenta.com/content/aip/journal/rsi/83/6/10.1063/1.4725527
10.1063/1.4725527
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