Schematic of the ODISC furnace alongside a photograph of the internal furnace set-up.
Cross section diagram of the lower section of the cell alongside photographic side-view showing the mounted furnace.
Schematic showing three chemical reactor configurations; (a) low-temperature system, (b) high-temperature system, and (c) hydrothermal configuration.
Circuit diagrams for the ODISC furnace controller; (a) temperature controller circuit and (b) interlocks circuit.
Schematic of the ODISC operating system with switch locations: 1. Water flow; 2. Water temperature; 3. Air pressure; 4. Chamber shutter; 5. Remote shut-off.
Top-view of the I12 sample stage illustrating ODISC base-plate compatibility.
Rutile EDXRD data for a sample of TiO2 using (a) the low-temperature reactor configuration and (b) the high-temperature reactor configuration. Inset: the rutile 110 reflection with full width at half maximum values from data obtained using both configurations.
Heating profile recorded using the high-temperature configuration. Thermocouple 1 was positioned between the sample tube and crucible. Thermocouple 2 was positioned within the sample volume. Inset: Close-up of the heating profile at the target temperature, 900 °C.
3D stack plot of EDXRD data for a sample of Bi2O3 heated to 900 °C
Background subtracted EDXRD data for a sample of Bi2O3 heated to 900 °C. (a) Countour plot and (b) extent of reaction vs. time plot (the solid lines are a guide for the eye only and have no physical significance).
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