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Pulsed laser deposition with simultaneous in situ real-time monitoring of optical spectroscopic ellipsometry and reflection high-energy electron diffraction
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10.1063/1.4798621
/content/aip/journal/rsi/84/4/10.1063/1.4798621
http://aip.metastore.ingenta.com/content/aip/journal/rsi/84/4/10.1063/1.4798621
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Figures

Image of FIG. 1.
FIG. 1.

Schematic drawing (left) and photograph (right) of the PLD system with dual in situ RHEED and spectroscopic ellipsometry components taking simultaneous measurements.

Image of FIG. 2.
FIG. 2.

(a)–(f) In situ data taken simultaneously by RHEED and SE during LMO thin-film growth on STO substrate. RHEED diffraction patterns taken at times (a) 0 s, (b) 250 s, and (c) 1080 s. (d) RHEED intensity oscillations. The two vertical lines indicate the start and finish of growth. SE dynamical spectra taken of (e) Ψ and (f) Δ at 0.5 Hz during the thin-film growth. Surface topology of (g) STO substrate and (h) LMO thin-film taken ex situ by AFM. Growth conditions: PO2 = 30 mTorr, substrate temperature Ts = 700 °C.

Image of FIG. 3.
FIG. 3.

Full SE spectral scans taken from 1.2 eV to 5.9 eV are shown at times (a) 100 s, (b) 500 s, and (c) 1090 s during the LMO film deposition.

Image of FIG. 4.
FIG. 4.

The optical constants from 1.2 eV to 5.9 eV for the (a) LMO thin-film N 1(n,k) and (b) STO substrate N 2(n,k) obtained from the in situ SE spectra at the end of the growth period. (c) Real-time thickness of LMO thin-film during the growth as determined independently by RHEED and SE. The measurements are self-consistent and support the validity of the model used to extract the optical constants and thickness from the SE spectra.

Image of FIG. 5.
FIG. 5.

The (a) dispersion ɛ1 and (b) absorption ɛ2 coefficients as obtained from applying Eqs. (4) and (5) to the SE optical constants extracted at 100 s, 300 s, and 1090 s.

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/content/aip/journal/rsi/84/4/10.1063/1.4798621
2013-04-04
2014-04-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Pulsed laser deposition with simultaneous in situ real-time monitoring of optical spectroscopic ellipsometry and reflection high-energy electron diffraction
http://aip.metastore.ingenta.com/content/aip/journal/rsi/84/4/10.1063/1.4798621
10.1063/1.4798621
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