1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Non-invasive in situ plasma monitoring of reactive gases using the floating harmonic method for inductively coupled plasma etching application
Rent:
Rent this article for
USD
10.1063/1.4799972
/content/aip/journal/rsi/84/4/10.1063/1.4799972
http://aip.metastore.ingenta.com/content/aip/journal/rsi/84/4/10.1063/1.4799972
/content/aip/journal/rsi/84/4/10.1063/1.4799972
Loading

Data & Media loading...

Loading

Article metrics loading...

/content/aip/journal/rsi/84/4/10.1063/1.4799972
2013-04-08
2014-07-28
Loading

Full text loading...

This is a required field
Please enter a valid email address
This feature is disabled while Scitation upgrades its access control system.
This feature is disabled while Scitation upgrades its access control system.
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Non-invasive in situ plasma monitoring of reactive gases using the floating harmonic method for inductively coupled plasma etching application
http://aip.metastore.ingenta.com/content/aip/journal/rsi/84/4/10.1063/1.4799972
10.1063/1.4799972
SEARCH_EXPAND_ITEM