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Two-dimensional-spatial distribution measurement of electron temperature and plasma density in low temperature plasmas
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10.1063/1.4802673
/content/aip/journal/rsi/84/5/10.1063/1.4802673
http://aip.metastore.ingenta.com/content/aip/journal/rsi/84/5/10.1063/1.4802673
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

(a)–(c) A schematic diagram of the measurement circuit. (a) An applying voltage and measuring current circuit, (b) multiplexer circuit and (c) a wafer shaped 2D array sensor are presented.

Image of FIG. 2.
FIG. 2.

Screen shot of the measurement program.

Image of FIG. 3.
FIG. 3.

Schematic diagram of the experimental setup.

Image of FIG. 4.
FIG. 4.

Real time measurement results with changing gas pressure at 300 W RF power. (a) The wafer shaped probe array; (b) The real time data of the ion density profile.

Image of FIG. 5.
FIG. 5.

2D spatial distribution of the plasma density (10 cm) at various RF powers at a fixed gas pressure of 10 mTorr in an Ar discharge: (a) 200 W, (b) 400 W, (c) 600 W. The non-uniformity is defined as σ/ where σ is the standard deviation of the 29 measured plasma densities, and is the average value of the 29 measured plasma densities. The powered antenna is located at the 1 o’ clock position of the figure, and all the ion flux distributions in this paper are plotted in the same way.

Image of FIG. 6.
FIG. 6.

2D spatial distribution of the electron temperature (eV) at various RF powers at 10 mTorr: (a) 200 W, (b) 400 W, (c) 600 W.

Image of FIG. 7.
FIG. 7.

2D spatial distribution of the plasma density (10 cm) with gas pressures at a fixed ICP power of 200 W. The spatially averaged plasma density and the non-uniformity were (a) 1 × 10 cm, 15.3%, (b) 2.2 × 10 cm, 18.3%, and (c) 3.6 × 10 cm, 19.1%.

Image of FIG. 8.
FIG. 8.

2D spatial distribution of the electron temperature (eV) with gas pressures at a fixed ICP power of 200 W: (a) 7 mTorr, (b) 15 mTorr, (c) 30 mTorr.

Image of FIG. 9.
FIG. 9.

2D spatial distribution of the ion flux (mA/cm) with different mixing ratios at a total gas pressure of 10 mTorr in Ar/O mixture plasma. The spatially averaged plasma density and the non-uniformity were (a) 0.69 mA/cm, 20.7% and (b) 0.30 mA/cm, 17.5%.

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/content/aip/journal/rsi/84/5/10.1063/1.4802673
2013-05-22
2014-04-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Two-dimensional-spatial distribution measurement of electron temperature and plasma density in low temperature plasmas
http://aip.metastore.ingenta.com/content/aip/journal/rsi/84/5/10.1063/1.4802673
10.1063/1.4802673
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