Photomask design for the aluminum deposition. The structures under “A” are banks of 32 heaters which can be contacted 16 heaters at a time via the square contact pads. “B” indicates a bank of 32 individual heaters. For both “A” and “B,” each heater is 25 μm wide, and is shown as a thin horizontal line, with two voltage sense lines spaced 1.4 mm apart. Note that each group of 16 heaters shares a central, thick current bus with its neighbor. The “C” structures are for electrical testing, and are not used in this experiment.
Schematic diagram of the experimental setup. Each heater has a single common contact (the “positive” AC out) and three switched contacts: the “negative” AC out, and two “sense” contacts connected to channels A and B of the lock-in amplifier.
Temperature amplitude per unit power as a function of SiO2 film thickness for all heaters.
Film thermal conductivity as calculated for each heater using three methods. To subtract the influence of the substrate and Al2O3, the temperature per unit power for a position with no SiO2 was measured, and this value was subtracted from the data at each SiO2 thickness. The dotted line indicates the error range for κ f calculated using the slope in Figure 4 .
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