Schematic of a neutron grating interferometer.
Fabrication process of new source grating: (a) photoresist material coating, (b) UV exposure and development, (c) deep reactive ion etching, (d) fabricated silicon structure, (e) pouring Gadox mixture, (f) precipitation of Gadox particles in vacuum chamber, (g) removing of remained Gadox particles, and (h) solidification in an oven.
(a) A source grating fabricated by the Gadox filling method and (b) a source grating fabricated by the Gd deposition method.
(a) An optical microscopy image of the fabricated silicon grating surface, (b) SEM images of the grating surface, and (c) SEM images of the grating cross section.
The neutron transmission images: (a) a conventional source grating with a 5 μm height, (b) a conventional source grating with a 10 μm height, (c) the new source grating, and (d) a line profile of the projection images.
Neutron grating interferometer setup at ENF: (a) overview of the inside ENF, (b) the source grating G0 and motorized stage, and (c) the phase grating G1, the analyzer grating G2, the lens coupled detector with a scintillation screen, and the motorized stage.
Measured pixel values by phase stepping and sine fitting curve.
The optimization of visibility by changing the G1-G2 distance.
(a) A dark-field image with the new source grating and a 5 cm Beryllium filter of the FeSi sample, and (b) a dark-field image with the new source grating and a 10 cm Beryllium filter of the FeSi sample.
Parameters of the designed grating interferometer setup at ENF.
G0 grating test conditions and visibilities.
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