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Design and operation of a rotating drum radio frequency plasma reactor for the modification of free nanoparticles
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10.1063/1.4811138
/content/aip/journal/rsi/84/6/10.1063/1.4811138
http://aip.metastore.ingenta.com/content/aip/journal/rsi/84/6/10.1063/1.4811138

Figures

Image of FIG. 1.
FIG. 1.

Schematic of the rotating drum reactor apparatus.

Image of FIG. 2.
FIG. 2.

High resolution C spectra of allylOH deposited in a CW plasma on Si wafers, supported np substrates, and fnps while the reactor was static (a)–(c) and rotating (d)–(f).

Image of FIG. 3.
FIG. 3.

FTIR spectra for -allylOH deposited in CW and pulsed plasmas on Si wafers. The dotted lines indicate the O−H, C−H, C=O, and C−O stretch vibrations.

Image of FIG. 4.
FIG. 4.

FTIR spectra for -allylOH deposited in CW and pulsed plasmas on supported np substrates. The dotted lines indicate the O−H, C−H, C=O, and C−O stretch vibrations.

Image of FIG. 5.
FIG. 5.

High resolution C spectra of allylOH deposited in a 5% d.c. pulsed plasma on (a) Si wafers, (b) supported np substrates, and (c) fnps.

Image of FIG. 6.
FIG. 6.

Scanning electron micrographs for (a) untreated fnps and (b) fnps coated in the rotating drum using a CW allylOH plasma (15 rpm, 60 min).

Image of FIG. 7.
FIG. 7.

XPS survey spectra of (a) as-received FeO fnps; (b) O cleaned FeO fnps; and (c) O plasma-cleaned FeO fnps subsequently treated in the rotating drum with a 50 W, 100 mTorr NH plasma (20 min, rotating at 15 rpm).

Tables

Generic image for table
Table I.

XPS atomic compositions for -allylOH films deposited on various substrates.

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/content/aip/journal/rsi/84/6/10.1063/1.4811138
2013-06-19
2014-04-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Design and operation of a rotating drum radio frequency plasma reactor for the modification of free nanoparticles
http://aip.metastore.ingenta.com/content/aip/journal/rsi/84/6/10.1063/1.4811138
10.1063/1.4811138
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