Diagram depicting the basic principle of an edge illumination XPCi system. The secondary beams created by the sample mask undergo a shift when passing through the detail causing their movement on to or off of the detector mask generating contrast.
Simple diagram of a laboratory edge illumination XPCi system in profile.
(a) and (b) Two potential mask designs, with (a) being column-skipping and (b) being non-column-skipping. (c) and (d) The respective images as seen by the detector following alignment.
Diagram of the drive unit used for mask positioning. 1 for translation along x axis; 2 for translation along y axis; 3 for translation along z axis; 4 for rotation about z axis; 5 for rotation about x axis; and 6 for rotation about y axis.
Intensity detected in a single pixel when an aligned mask is scanned in the transverse x-direction in sub-pixel increments over the pixel edge.
Example plots of the function G showing the mask alignment process where the x and y axes refer to the image plane, and the z axis refers to Δx. (a) Plot from a randomly misaligned mask. (b) Alignment about x and z axes corrected (alignment about x axis corrected by making step period at top and bottom of the mask constant, and about z axis by orientating steps vertically along z axis). (c) and (d) Rotation about y axis is progressively corrected, thus making the period of steps constant. (e) Plot is flattened by translating mask along z axis, leading to semi-optimal alignment (see text).
Intensity detected in a single pixel when the aligned sample mask is scanned in the transverse x-direction in sub-pixel increments over the aligned detector mask.
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