A cross-sectional view and electrical arrangement of arc chamber of Bernas type ion source.
A cross-sectional view and electrical arrangement of arc chamber of IHC (indirectly heated cathode) type ion source.
Halogen cycle of halogen plasma in ion source chamber.
An overview of cluster ion source and principal of generating cluster ions.
Molybdenum contamination at BF2 + implant. Ion source materials are molybdenum and tungsten.
A typical mass spectrum from Bernus type ion source with Al2O3 sputter targets. (a) Ar gas discharge and (b) BF3 gas discharge.
An external view of iG5 ion source.
Mass spectrum of a high current B+ beam extracted from BF3 plasma. Boron beam current density of 1 mA/cm (that is about 130 mA) was obtained at the condition of the extraction current of about 700 mA.
Typical ion implantation and ion source requirements.
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