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New Gas Chemistry for High‐Performance SiO2 Patterning in Sub‐0.1 μ m ULSIs
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10.1063/1.1516327
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/content/aip/proceeding/aipcp/10.1063/1.1516327
2002-10-21
2014-04-25
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229c8a00d8fe88cf152414eb5d9cd803 conferences.conference_paperzxybnytfddd
Scitation: New Gas Chemistry for High‐Performance SiO2 Patterning in Sub‐0.1 μ m ULSIs
http://aip.metastore.ingenta.com/content/aip/proceeding/aipcp/10.1063/1.1516327
10.1063/1.1516327
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