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Finite Element Analysis for Development of Next‐generation Heater in Heat Treatment Process for Silicon wafer
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10.1063/1.1766735
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/content/aip/proceeding/aipcp/10.1063/1.1766735
2004-06-10
2014-09-02
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229c8a00d8fe88cf152414eb5d9cd803 conferences.conference_paperzxybnytfddd
Scitation: Finite Element Analysis for Development of Next‐generation Heater in Heat Treatment Process for Silicon wafer
http://aip.metastore.ingenta.com/content/aip/proceeding/aipcp/10.1063/1.1766735
10.1063/1.1766735
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