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In‐Line Control and Rapid Process Development of Nitrided Gate Oxides
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/content/aip/proceeding/aipcp/10.1063/1.2062958
2005-09-09
2015-03-01
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229c8a00d8fe88cf152414eb5d9cd803 conferences.conference_paperzxybnytfddd
Scitation: In‐Line Control and Rapid Process Development of Nitrided Gate Oxides
http://aip.metastore.ingenta.com/content/aip/proceeding/aipcp/10.1063/1.2062958
10.1063/1.2062958
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