1887
banner image
Residual Stresses in Ta, Mo, Al and Pd Thin Films Deposited by E‐Beam Evaporation Process on Si and Si/SiO2 Substrates
Rent:
Rent this article for
USD
10.1063/1.2173565
Loading

Article metrics loading...

/content/aip/proceeding/aipcp/10.1063/1.2173565
2006-02-07
2014-07-28
This is a required field
Please enter a valid email address
This feature is disabled while Scitation upgrades its access control system.
This feature is disabled while Scitation upgrades its access control system.
229c8a00d8fe88cf152414eb5d9cd803 conferences.conference_paperzxybnytfddd
Scitation: Residual Stresses in Ta, Mo, Al and Pd Thin Films Deposited by E‐Beam Evaporation Process on Si and Si/SiO2 Substrates
http://aip.metastore.ingenta.com/content/aip/proceeding/aipcp/10.1063/1.2173565
10.1063/1.2173565
SEARCH_EXPAND_ITEM