- Conference date: 28 May-2 June 2006
- Location: Daegu (Korea)
We present first results of the fabrication process of a diffractive optical element (DOE) using deep X‐ray lithography. The DOE forms the core of our proposed fast parallel‐processing infrared Fourier transform interferometer (FPP FTIR) that works without moving parts and may allow instantaneous spectral analysis only limited by detector bandwidth. Design and specifications of the DOE are discussed. A fabrication process including deep X‐ray lithography (DXRL) on stepped substrates is introduced.
- Diffractive optical elements
- Optical fabrication
- Fourier analysis
- Fourier transform infrared spectroscopy
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