- Conference date: 8–13 June 2008
- Location: Monterey (California)
EXCEED9600A was developed not only as medium current implanter, but also as implanter for the high energy range. The energy domain that can be used is 3 to 320 keV in single ion operation. In comparison with EXCEED3000AH implanter (3 to 250 keV), the upper energy limit has been increased by 70 keV. Comparing with EXCEED3000AH, most of the system components are the same, except for the high voltage cabinet and acceleration tube, which have increased volume and length, respectively. Several productivity improvement functions are added, for example, throughput has been improved by reducing auto set‐up time. In this paper, the detailed machine performance is reviewed and the improved productivity and the reliability characteristics are also precisely explained.
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