- Conference date: 12–16 January 2009
- Location: Kuala Lumpur (Malaysia)
Hydrogenated silicon (Si‐H) thin films were deposited from a mixture of pure silane and hydrogen gases in a home‐built plasma enhanced chemical vapour deposition (PECVD) system using the layer‐by‐layer (LBL) deposition technique. In the LBL process, the deposition was performed by periodically alternating the deposition of Si:H layer with the hydrogen treatment process of the growth surface. In this work, the effects of the H pasma treatment time to Si‐H layer growth time ratio on the film properties were studied. The LBL deposited Si‐H films studied in this work were deposited using different Si‐H layer growth times ranging from 2 minutes to 7 minutes with the hydrogen plasma treatment time on the growth surface fixed at 3 minutes. Optical transmission spectroscopy, X‐ray diffraction (XRD), micro‐Raman scattering spectroscopy, Fourier transform infrared (FTIR) spectroscopy and atomic force microscopy (AFM) measurements were done on these films to investigate the optical, structural and morphological properties of the films. The films deposited by this technique produced the highest deposition rate of 6.3 Å/s when the growth time of the Si‐H layer was fixed at 5 minutes. These films were amorphous in structure and had large optical energy gaps irrespective of the Si‐H layer deposition time. High concentration of cone‐like structures was observed in the AFM images for the films deposited using the higher Si‐H layer deposition times.
- Plasma deposition
- Thin film structure
- Thin films
- Thin film growth
- Fourier transform infrared spectroscopy
Daniel Baumann, Mark G. Jackson, Peter Adshead, Alexandre Amblard, Amjad Ashoorioon, Nicola Bartolo, Rachel Bean, Maria Beltrán, Francesco de Bernardis, Simeon Bird, Xingang Chen, Daniel J. H. Chung, Loris Colombo, Asantha Cooray, Paolo Creminelli, Scott Dodelson, Joanna Dunkley, Cora Dvorkin, Richard Easther, Fabio Finelli, Raphael Flauger, Mark P. Hertzberg, Katherine Jones‐Smith, Shamit Kachru, Kenji Kadota, Justin Khoury, William H. Kinney, Eiichiro Komatsu, Lawrence M. Krauss, Julien Lesgourgues, Andrew Liddle, Michele Liguori, Eugene Lim, Andrei Linde, Sabino Matarrese, Harsh Mathur, Liam McAllister, Alessandro Melchiorri, Alberto Nicolis, Luca Pagano, Hiranya V. Peiris, Marco Peloso, Levon Pogosian, Elena Pierpaoli, Antonio Riotto, Uroš Seljak, Leonardo Senatore, Sarah Shandera, Eva Silverstein, Tristan Smith, Pascal Vaudrevange, Licia Verde, Ben Wandelt, David Wands, Scott Watson, Mark Wyman, Amit Yadav, Wessel Valkenburg and Matias Zaldarriaga
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