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Influence of Hydrogen Plasma Treatment Time to Si:H Layer Deposition Time Ratio on the Properties of Layer‐by‐Layer Deposited Hydrogenated Silicon (Si:H) Thin Films
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10.1063/1.3192250
/content/aip/proceeding/aipcp/10.1063/1.3192250
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/content/aip/proceeding/aipcp/10.1063/1.3192250
2009-07-07
2014-10-23
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229c8a00d8fe88cf152414eb5d9cd803 conferences.conference_paperzxybnytfddd
Scitation: Influence of Hydrogen Plasma Treatment Time to Si:H Layer Deposition Time Ratio on the Properties of Layer‐by‐Layer Deposited Hydrogenated Silicon (Si:H) Thin Films
http://aip.metastore.ingenta.com/content/aip/proceeding/aipcp/10.1063/1.3192250
10.1063/1.3192250
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